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dc.contributor.authorЯценко, Ірина В'ячеславівна-
dc.contributor.authorАнтонюк, Віктор Степанович-
dc.contributor.authorКириченко, Оксана В'ячеславівна-
dc.contributor.authorГордієнко, Валентин Іванович-
dc.contributor.authorВащенко, Вячеслав Андрійович-
dc.date.accessioned2019-09-29T09:18:48Z-
dc.date.available2019-09-29T09:18:48Z-
dc.date.issued2017-
dc.identifier.issn2367-749Х-
dc.identifier.issn2537-8477-
dc.identifier.urihttp://er.chdtu.edu.ua/handle/ChSTU/756-
dc.description.abstractThe optimal parameters of the ranges of the electron beam are found (heat density, velocity, displacement), within which there is improvement of the physical and mechanical properties of surface layers of optical elements: there is no formation of negative defects on their surfaces which become atomically smooth (residual microscopic ridges do not exceed 0.5… 1.5 nm); the microhardness of the surface increases, hardened layers are formed with compressive stresses. This leads to the reduction of the light scattering coefficient of surface layers of elements and increase of their coefficient of infrared radiation transmittance and, ultimately, to the improvement of metrological characteristics and reliability of devices under intensive external thermal action.uk_UA
dc.language.isoenuk_UA
dc.publisherInt. Sci. J. “Material Science. Nonequilibrium Phase Transformations”uk_UA
dc.subjectoptoelectronic devicesuk_UA
dc.subjectoptical glassuk_UA
dc.subjectoptical ceramicsuk_UA
dc.subjectelectron beamuk_UA
dc.subjectoptical characteristicsuk_UA
dc.titleImprovement of optical characteristics of components of optoelectronic devices in the harsh conditions of their functioning by using electron beam technologyuk_UA
dc.typeArticleuk_UA
dc.citation.issue2uk_UA
dc.citation.spage42uk_UA
dc.citation.epage48uk_UA
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