Please use this identifier to cite or link to this item: https://er.chdtu.edu.ua/handle/ChSTU/2945
Full metadata record
DC FieldValueLanguage
dc.contributor.authorOsypenko, Vasyl-
dc.contributor.authorStupak, Denys-
dc.contributor.authorTryhub, Oksana-
dc.contributor.authorBilan, Anatolii-
dc.contributor.authorОсипенко, Василь Іванович-
dc.contributor.authorСтупак, Денис Олегович-
dc.contributor.authorТригуб, Оксана Анатоліївна-
dc.contributor.authorБілан, Анатолій Валентинович-
dc.date.accessioned2021-11-30T13:18:42Z-
dc.date.available2021-11-30T13:18:42Z-
dc.date.issued2012-
dc.identifier.issn1068 3755-
dc.identifier.urihttps://er.chdtu.edu.ua/handle/ChSTU/2945-
dc.description.abstractThis article is devoted to the calculation of the electrostatic field configuration in the interelec trode gap during electrochemical treatment using thin wire electrodes. The results calculated are experimen tally verified. The possibility of predicting the accuracy of the detailed formation and for calculating the needed processing modes using the drawings of the applied perspective hybrid technology has been shown.uk_UA
dc.language.isoenuk_UA
dc.publisherSurface Engineering and Applied Electrochemistryuk_UA
dc.subjectwire electrodeuk_UA
dc.subjectanodic dissolutionuk_UA
dc.subjectapply electrochemistryuk_UA
dc.subjectsurface engineeruk_UA
dc.subjectanode current densityuk_UA
dc.titleCalculation of the Parameters of the Technological Current Density Distribution during Wire Electrode Electrochemical Processinguk_UA
dc.typeArticleuk_UA
dc.citation.volume48uk_UA
dc.citation.issue2uk_UA
dc.citation.spage105uk_UA
dc.citation.epage110uk_UA
dc.identifier.doi10.3103/S106837551202010X-
Appears in Collections:Наукові публікації викладачів (ФКТМД)

Files in This Item:
File Description SizeFormat 
71404c4bcd37000d96f5e1370174552f.pdf398.4 kBAdobe PDFThumbnail
View/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.